New method of coating AFM tip for positioning ink deposition

Document Type

Article

Publication Date

3-1-2008

Abstract

In this paper, we present a coating AFM tip method to facilitate the dip-pen nanolithography (DPN) processes. The small amount of ink can be limited to the apex of atomic force microscope (AFM) tip by adjusting AFM operation parameters. With this automatic AFM-engage system overloading ink, usually disturbing imaging and manipulating, can be avoided. Thereby, a uniform nanoarray of CuCl2 is constructed on a DNA molecule. The unique technique may provide a novel approach to precisely modify biological molecule at the nano-meter scale.

Publication Source (Journal or Book title)

He Jishu/Nuclear Techniques

First Page

237

Last Page

240

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