A new technique for deposition of titanium carbonitride films at room temperature by high energy density pulse plasma

Authors

Pengxun Yan, Institute of Physics Chinese Academy of Sciences
Si ze Yang, Institute of Physics Chinese Academy of Sciences
Bin Li, Institute of Physics Chinese Academy of Sciences
Xishen Chen, Institute of Physics Chinese Academy of Sciences

Document Type

Article

Publication Date

1-1-1995

Abstract

Thin films of titanium carbonitride were deposited by high energy density pulse plasma technique onto a No. 45 steel substrate at room temperature. The pulse plasma was generated from a coaxial plasma gun. The plasma has a high electron temperature, high electron density, high translational speed and a short width of pulse. The mechanical properties of No. 45 steel were improved greatly by deposition titanium carbonitride films. © 1995 Elsevier Science B.V. All rights reserved.

Publication Source (Journal or Book title)

Nuclear Inst. and Methods in Physics Research, B

First Page

55

Last Page

58

Recommended Citation

Yan, P., Yang, S., Li, B., & Chen, X. (1995). A new technique for deposition of titanium carbonitride films at room temperature by high energy density pulse plasma. Nuclear Inst. and Methods in Physics Research, B, 95 (1), 55-58. https://doi.org/10.1016/0168-583X(94)00305-X