A new technique for deposition of titanium carbonitride films at room temperature by high energy density pulse plasma

Document Type

Article

Publication Date

1-1-1995

Abstract

Thin films of titanium carbonitride were deposited by high energy density pulse plasma technique onto a No. 45 steel substrate at room temperature. The pulse plasma was generated from a coaxial plasma gun. The plasma has a high electron temperature, high electron density, high translational speed and a short width of pulse. The mechanical properties of No. 45 steel were improved greatly by deposition titanium carbonitride films. © 1995 Elsevier Science B.V. All rights reserved.

Publication Source (Journal or Book title)

Nuclear Inst. and Methods in Physics Research, B

First Page

55

Last Page

58

This document is currently not available here.

Share

COinS