Photoelectron angular distributions of ultrathin Ni/Cu(001) films

Document Type

Article

Publication Date

1-1-1996

Abstract

We present measurements of the evolution with film thickness of the 3d electronic states at the Fermi energy of ultrathin Ni films. The morphology and thickness of the films is determined from x-ray photoelectron spectroscopy, x-ray photoelectron diffraction and x-ray magnetic linear dichroism using synchrotron radiation. Photoelectron angular distributions were measured using an ellipsoidal mirror analyzer. Even at submonolayer Ni coverages, the 3d electronic stakes exhibit bulk-like properties. This is attributed to the short screening length of electrons in metals, the localization of the 3d electrons, the similarity of the Ni and Ca ion cores, and finally the interaction with the underlying fcc periodic potential.

Publication Source (Journal or Book title)

Materials Research Society Symposium Proceedings

First Page

39

Last Page

46

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