Soft UV-nanoimprint lithography on non-planar surfaces
Document Type
Article
Publication Date
11-1-2011
Abstract
We report on a simple and effective process that allows direct UV-imprinting of micro- and nanostructures on non-planar surfaces, even at sharp edges such as step surfaces. The key for the process is the use of a thin flexible polymer stamp, which was fabricated by spin-coating poly(dimethylsiloxane) (PDMS) on a pre-patterned Si or poly(methyl methacrylate) (PMMA) master and releasing the thin PDMS layer after curing. The thin PDMS stamp was used to conformally mold a UV resist layer coated on various non-planar substrates with different radii of curvature. With this method, we have successfully demonstrated micro- and nanopatterns down to 63 nm on curved surfaces as well as sharp step-like structures. The process so developed will improve the versatility and applicability of molding technologies in many applications that require patterning non-planar substrates, considering that most molding technologies allow for patterning only on planar substrates or surfaces with large curvature radii. © 2011 Elsevier B.V. All rights reserved.
Publication Source (Journal or Book title)
Microelectronic Engineering
First Page
3287
Last Page
3292
Recommended Citation
Farshchian, B., Amirsadeghi, A., Hurst, S., Wu, J., Lee, J., & Park, S. (2011). Soft UV-nanoimprint lithography on non-planar surfaces. Microelectronic Engineering, 88 (11), 3287-3292. https://doi.org/10.1016/j.mee.2011.07.010