Title
Scanning Force Microscopy Studies of Enhanced Metal Nucleation: Au Vapor Deposited on Self-Assembled Monolayers of Substituted Silanes
Document Type
Article
Publication Date
10-1-1994
Abstract
Scanning force microscopy was used to observe the topography of vapor-deposited Au films on various silane monolayers. Thin (1–10 nm) evaporated Au films deposited onto monolayers of (CH3O)3Si(CH2)3X (X = ‒SH, ‒NH2, and ‒CH3) on SiO2/Si(111) display morphologies which are dependent on the nature of the Au-X interaction. Macroscopic adhesion tests indicate that the Au is strongly bound to the amine and thiol surfaces. The electrical resistivity of 8 nm thick Au films deposited on the amine-terminated surface was found to be 7 orders of magnitude lower than that for the thiol-terminated surface, indicating that the amine-terminated surface favors an increased number of nucleation sites. © 1994, American Chemical Society. All rights reserved.
Publication Source (Journal or Book title)
Langmuir
First Page
3598
Last Page
3606
Recommended Citation
Dunaway, D., & McCarley, R. (1994). Scanning Force Microscopy Studies of Enhanced Metal Nucleation: Au Vapor Deposited on Self-Assembled Monolayers of Substituted Silanes. Langmuir, 10 (10), 3598-3606. https://doi.org/10.1021/la00022a037