Effect of a finite oxide layer on the Faraday rotation and ellipticity in a metal-oxide-semiconductor system
Document Type
Article
Publication Date
1-1-1985
Abstract
We study the effect of a finite oxide layer on the Faraday rotation and ellipticity in a metal-oxide-semiconductor system. We find that the multiple internal reflections within the oxide layer can give an enhancement on the order of 21% over the case where the oxide layer is considered semi-infinite. At high magnetic fields, there is serious disagreement between theory and experiment. © 1985 The American Physical Society.
Publication Source (Journal or Book title)
Physical Review B
First Page
5208
Last Page
5211
Recommended Citation
Khandker, A., Oconnell, R., & Wallace, G. (1985). Effect of a finite oxide layer on the Faraday rotation and ellipticity in a metal-oxide-semiconductor system. Physical Review B, 31 (8), 5208-5211. https://doi.org/10.1103/PhysRevB.31.5208