Title
Quantum lithography: A non-computing application of quantum information
Document Type
Article
Publication Date
10-16-2006
Abstract
Quantum information theory holds the promise of revolutionizing technologies other than computing and communications. In this article we show how quantum entanglement can be harnessed to beat the Rayleigh diffraction limit of conventional optical lithography, and to permit nano-devices to be fabricated at a scale arbitrarily shorter than the wavelength used. Given the relative ease of performing optical lithography compared with other schemes, and the relative costs associated in migrating the lithography industry to each new fabrication technology, exploiting quantum entanglement to extend the useful life of optical lithography could be economically attractive. © Springer-Verlag 2006.
Publication Source (Journal or Book title)
Atmospheric Chemistry and Physics
First Page
73
Last Page
82
Recommended Citation
Williams, C., Kok, P., Lee, H., & Dowling, J. (2006). Quantum lithography: A non-computing application of quantum information. Atmospheric Chemistry and Physics, 6 (12), 73-82. Retrieved from https://repository.lsu.edu/physics_astronomy_pubs/3153