Perforated micro-and nanopores in free-standing polymer membranes fabricated by nanoimprint lithography and pressed self-perfection method
Document Type
Conference Proceeding
Publication Date
1-1-2010
Abstract
This study presents a stable and flexible method for fabricating a free-standing polymer membrane with perforated micro- and nanopores using an imprint lithography combined with a pressed self-perfection method and a sacrificial layer technique. For the fabrication, micropores were initially patterned on a double resist layer: the upper SU-8 resist layer as an active membrane layer and the lower life-off resist used as a sacrificial layer. The membrane with micropores was then pressed with a flat quartz wafer to reduce pore size down to sub-micrometer. Finally, a free-standing SU-8 membrane with perforated micro- and nanopores was successfully lifted-off from the substrate by dissolving the sacrificial layer. Copyright © 2010 by ASME.
Publication Source (Journal or Book title)
ASME International Mechanical Engineering Congress and Exposition, Proceedings
First Page
805
Last Page
809
Recommended Citation
Choi, J., & Park, S. (2010). Perforated micro-and nanopores in free-standing polymer membranes fabricated by nanoimprint lithography and pressed self-perfection method. ASME International Mechanical Engineering Congress and Exposition, Proceedings, 12 (PART B), 805-809. https://doi.org/10.1115/IMECE2009-11230