Dependence of demolding force on resist composition in ultraviolet nanoimprint lithography
Document Type
Conference Proceeding
Publication Date
11-9-2010
Abstract
We investigated demolding force in UV nanoimprint lithography with different compositions of UV-curable polymer blends containing polypropylene glycol diacrylate as the base, trimethylolpropane triacrylate as the crosslinking agent and Irgacure 651 as the photo-initiator. The demolding force was measured using a tensile test machine with homemade fixtures. The variations of demolding force was compared to shrinkage due to the polymerization and Young's moduli of cured polymer blends, determined by a simple optical method and atomic force microscopy, respectively. It was found that decreasing the content of the crosslinking agent from 49 to 0 wt% decreases the Young's modulus from 30±3 to 12±3 MPa and that in turn decreases the demolding force by almost half, with no significant effect on pattern fidelity.
Publication Source (Journal or Book title)
Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - Technical Proceedings of the 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010
First Page
272
Last Page
275
Recommended Citation
Amirsadeghi, A., Lee, J., & Park, S. (2010). Dependence of demolding force on resist composition in ultraviolet nanoimprint lithography. Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - Technical Proceedings of the 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010, 2, 272-275. Retrieved from https://repository.lsu.edu/mechanical_engineering_pubs/1946