Characterization of high temperature deposited Ti-contalning hydrogenated carbon thin films

Document Type

Article

Publication Date

12-15-2004

Abstract

A detailed structural and mechanical characterization was performed on Ti-containing hydrogenated amorphous carbon (Ti-C:H) thin films deposited at ∼600°C by plasma assisted hybrid chemical/physical vapor deposition. The structural and mechanical characteristics of these specimens were compared to those deposited at the lower temperature of ∼250°C. The results indicated that Ti-C:H consisted of a nanocrystalline TiC phase and a hydrogenated amorphous carbon (a-C:H) phase, and that Ti atoms were incorporated into Ti-C:H predominantly as Bl-TiC. Deposition at ∼600°C promoted TiC precipitation, resulting in little Ti dissolution within the a-C:H matrix. High temperature deposited Ti-C:H specimens were found to possess lower modulus and hardness values as compared to low temperature deposited specimens, especially at low Ti compositions. This is rationalized by electron microscopy evidence of increased short and medium range graphitic order within the a-C:H matrix of high temperature deposited Ti-C:H, and supported by additional Raman spectroscopic observations. Heat treatments at 600°C combined with Raman scattering measurements showed that the a-C:H matrix in high temperature deposited Ti-C:H specimens appears to be less structurally sensitive to additional annealing. © 2004 American Institute of Physics.

Publication Source (Journal or Book title)

Journal of Applied Physics

First Page

7705

Last Page

7713

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