Deposition of thin film ceramics and ceramic nanocomposites by inductively coupled plasma assisted hybrid chemical/physical vapor deposition

Document Type

Article

Publication Date

1-1-2000

Abstract

We have constructed a hybrid chemical/physical vapor deposition (CVD/PVD) tool by combining low-pressure high-density inductively coupled plasma with balanced magnetron sputtering. We show that such a hybrid deposition tool allows the independent control of energy and flux of ionic species bombarding the deposition surface. Using such a deposition tool, fully dense refractory ceramic thin films such as TiN can be deposited at approximately 100 K. The combination of CVD and PVD in such a deposition tool allows the deposition of TiC/amorphous hydrocarbon (a-C:H) nanocomposite coatings with wide ranging TiC volume fractions. Microstructures of these ceramic/ceramic nanocomposites will be described. Our results demonstrate the utility of low-pressure high-density plasmas in synthesis of novel thin film nanomaterials.

Publication Source (Journal or Book title)

IEEE International Conference on Plasma Science

First Page

88

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