Copper oxide removal activity in nonaqueous carboxylic acid solutions

Document Type

Article

Publication Date

4-8-2013

Abstract

Flip chip joint quality and reliability are strong functions of process parameters, materials and reactions before, during, and after solder reflow. In this work, we examine CuOx removal effectiveness of nonaqueous carboxylic acid solutions using electrochemical methods at temperatures from 100°C to 180°C. Chronopotentiometry and gravimetric analysis were used to study reaction kinetics, FTIR was used to study surface chemistry, and spectrophotometry was used to quantify reactant and product solubilities. Kinetics were investigated using carboxylic acid solutions such as adipic acid or maleic acid in polyethylene glycol. Carboxylic acid-based solutions with complexing agents show CuOx removal rates are similar to hydrochloric acid solutions at temperatures above 140°C. Results suggest the combination of proton-donating complexing agents with carboxylic acids can increase CuO x removal rates by an order of magnitude over solutions without complexing agents. A model including the formation of soluble Cu2+ complexes and the regeneration of carboxylic acids is presented. © 2013 The Electrochemical Society.

Publication Source (Journal or Book title)

Journal of the Electrochemical Society

This document is currently not available here.

Share

COinS